. .
Deutsch
Deutschland
Ähnliche Bücher
Weitere, andere Bücher, die diesem Buch sehr ähnlich sein könnten:
Suchtools
Anmelden

Anmelden mit Facebook:

Registrieren
Passwort vergessen?


Such-Historie
Merkliste
Links zu eurobuch.com

Dieses Buch teilen auf…
..?
Buchtipps
Aktuelles
Tipp von eurobuch.com
FILTER
- 0 Ergebnisse
Kleinster Preis: 164.52 EUR, größter Preis: 223.63 EUR, Mittelwert: 204.57 EUR
Auger- and X-Ray Photoelectron Spectroscopy in Materials Science - Siegfried Hofmann
Vergriffenes Buch, derzeit bei uns nicht verfügbar.
(*)
Siegfried Hofmann:

Auger- and X-Ray Photoelectron Spectroscopy in Materials Science - neues Buch

ISBN: 9783642273803

[ED: Buch], [PU: Springer-Verlag GmbH], Neuware - To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented., [SC: 0.00], Neuware, gewerbliches Angebot, FixedPrice, [GW: 939g]

Neues Buch Booklooker.de
Buchhandlung Kühn GmbH
Versandkosten:Versandkostenfrei, Versand nach Deutschland (EUR 0.00)
Details...
(*) Derzeit vergriffen bedeutet, dass dieser Titel momentan auf keiner der angeschlossenen Plattform verfügbar ist.
Auger- and X-Ray Photoelectron Spectroscopy in Materials Science - Siegfried Hofmann
Vergriffenes Buch, derzeit bei uns nicht verfügbar.
(*)

Siegfried Hofmann:

Auger- and X-Ray Photoelectron Spectroscopy in Materials Science - neues Buch

ISBN: 9783642273803

[ED: Buch], [PU: Springer-Verlag GmbH], Neuware - To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented. -, [SC: 0.00]

Neues Buch Booklooker.de
Sparbuchladen
Versandkosten:Versandkostenfrei, Versand nach Deutschland (EUR 0.00)
Details...
(*) Derzeit vergriffen bedeutet, dass dieser Titel momentan auf keiner der angeschlossenen Plattform verfügbar ist.
Auger- and X-Ray Photoelectron Spectroscopy in Materials Science: A User-Oriented Guide - Siegfried Hofmann
Vergriffenes Buch, derzeit bei uns nicht verfügbar.
(*)
Siegfried Hofmann:
Auger- and X-Ray Photoelectron Spectroscopy in Materials Science: A User-Oriented Guide - gebunden oder broschiert

ISBN: 9783642273803

ID: 9783642273803

Auger- and X-Ray Photoelectron Spectroscopy in Materials Science: A User-Oriented Guide Auger-and-X-Ray-Photoelectron-Spectroscopy-in-Materials-Science~~Siegfried-Hofmann Science/Tech>Physics>Physics Hardcover, Springer Berlin Heidelberg

Neues Buch Barnesandnoble.com
new Versandkosten:zzgl. Versandkosten
Details...
(*) Derzeit vergriffen bedeutet, dass dieser Titel momentan auf keiner der angeschlossenen Plattform verfügbar ist.
Auger- and X-ray Photoelectron Spectroscopy in Materials Science - Siegfried Hofmann
Vergriffenes Buch, derzeit bei uns nicht verfügbar.
(*)
Siegfried Hofmann:
Auger- and X-ray Photoelectron Spectroscopy in Materials Science - neues Buch

2012, ISBN: 3642273807

ID: 17167577122

[EAN: 9783642273803], Neubuch, [PU: Springer-Verlag Berlin and Heidelberg GmbH and Co. KG], New Book. Shipped from US within 10 to 14 business days. THIS BOOK IS PRINTED ON DEMAND. Established seller since 2000.

Neues Buch Abebooks.de
PBShop, Secaucus, NJ, U.S.A. [61989342] [Rating: 4 (von 5)]
NEW BOOK Versandkosten: EUR 13.18
Details...
(*) Derzeit vergriffen bedeutet, dass dieser Titel momentan auf keiner der angeschlossenen Plattform verfügbar ist.
Auger- And X-Ray Photoelectron Spectroscopy in Materials Science: A User-Oriented Guide - Hofmann, Siegfried
Vergriffenes Buch, derzeit bei uns nicht verfügbar.
(*)
Hofmann, Siegfried:
Auger- And X-Ray Photoelectron Spectroscopy in Materials Science: A User-Oriented Guide - gebunden oder broschiert

2012, ISBN: 9783642273803

ID: 13265490296

Hard cover, New., Sewn binding. Cloth over boards. 528 p. Contains: Illustrations, color. Springer Series in Surface Sciences, 49., [PU: Springer]

Neues Buch Alibris.com
Shams
Versandkosten:zzgl. Versandkosten
Details...
(*) Derzeit vergriffen bedeutet, dass dieser Titel momentan auf keiner der angeschlossenen Plattform verfügbar ist.

< zum Suchergebnis...
Details zum Buch
Auger- and X-Ray Photoelectron Spectroscopy in Materials Science
Autor:

Siegfried Hofmann

Titel:

Auger- and X-Ray Photoelectron Spectroscopy in Materials Science

ISBN-Nummer:

3642273807

Detailangaben zum Buch - Auger- and X-Ray Photoelectron Spectroscopy in Materials Science


EAN (ISBN-13): 9783642273803
ISBN (ISBN-10): 3642273807
Gebundene Ausgabe
Erscheinungsjahr: 2012
Herausgeber: Springer-Verlag GmbH
528 Seiten
Gewicht: 0,939 kg
Sprache: Englisch

Buch in der Datenbank seit 19.06.2007 21:28:18
Buch zuletzt gefunden am 22.09.2016 23:58:30
ISBN/EAN: 3642273807

ISBN - alternative Schreibweisen:
3-642-27380-7, 978-3-642-27380-3

< zum Suchergebnis...
< zum Archiv...
Benachbarte Bücher