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Handbook of Semiconductor Manufacturing Technology, Second Edition - Yoshio Nishi, Robert Doering
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Yoshio Nishi, Robert Doering:

Handbook of Semiconductor Manufacturing Technology, Second Edition - gebunden oder broschiert

ISBN: 1574446754

[SR: 960565], Hardcover, [EAN: 9781574446753], CRC Press, CRC Press, Book, [PU: CRC Press], CRC Press, Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available.Stay Current with the Latest TechnologiesIn addition to updates to nearly every existing chapter, this edition features five entirely new contributions on…Silicon-on-insulator (SOI) materials and devicesSupercritical CO2 in semiconductor cleaningLow-κ dielectricsAtomic-layer depositionDamascene copper electroplatingEffects of terrestrial radiation on integrated circuits (ICs)Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication.While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at ha, 107178011, Design, 13698, Circuits, 227544, Electrical & Electronics, 173515, Engineering, 173507, Engineering & Transportation, 1000, Subjects, 283155, Books, 13725, Semiconductors, 13707, Electronics, 227544, Electrical & Electronics, 173515, Engineering, 173507, Engineering & Transportation, 1000, Subjects, 283155, Books, 227551, Industrial Technology, 227550, Industrial, Manufacturing & Operational Systems, 173515, Engineering, 173507, Engineering & Transportation, 1000, Subjects, 283155, Books, 13769, Manufacturing, 227550, Industrial, Manufacturing & Operational Systems, 173515, Engineering, 173507, Engineering & Transportation, 1000, Subjects, 283155, Books, 13803, Reference, 392163011, American National Standards Institute (ANSI) Publications, 1061, Architecture, 7976021011, History, 13843, Measurements, 52156011, Patents & Inventions, 7921654011, Research, 173515, Engineering, 173507, Engineering & Transportation, 1000, Subjects, 283155, Books, 13809, Telecommunications & Sensors, 107172011, Antennas, 13816, Microwaves, 3747, Networks, 13801, Radar, 13818, Radio, 13684, Remote Sensing & GIS, 107177011, Satellite, 7921655011, Signal Processing, 13820, Telephone Systems, 13822, Television & Video, 173515, Engineering, 173507, Engineering & Transportation, 1000, Subjects, 283155, Books, 465600, New, Used & Rental Textbooks, 468220, Business & Finance, 468226, Communication & Journalism, 468204, Computer Science, 468224, Education, 468212, Engineering, 468206, Humanities, 468222, Law, 468228, Medicine & Health Sciences, 684283011, Reference, 468216, Science & Mathematics, 468214, Social Sciences, 684300011, Test Prep & Study Guides, 2349030011, Specialty Boutique, 283155, Books

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Yoshio Nishi, Robert Doering:

Handbook of Semiconductor Manufacturing Technology, Second Edition - gebunden oder broschiert

ISBN: 1574446754

[SR: 960565], Hardcover, [EAN: 9781574446753], CRC Press, CRC Press, Book, [PU: CRC Press], CRC Press, Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available.Stay Current with the Latest TechnologiesIn addition to updates to nearly every existing chapter, this edition features five entirely new contributions on…Silicon-on-insulator (SOI) materials and devicesSupercritical CO2 in semiconductor cleaningLow-κ dielectricsAtomic-layer depositionDamascene copper electroplatingEffects of terrestrial radiation on integrated circuits (ICs)Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication.While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at ha, 107178011, Design, 13698, Circuits, 227544, Electrical & Electronics, 173515, Engineering, 173507, Engineering & Transportation, 1000, Subjects, 283155, Books, 13725, Semiconductors, 13707, Electronics, 227544, Electrical & Electronics, 173515, Engineering, 173507, Engineering & Transportation, 1000, Subjects, 283155, Books, 227551, Industrial Technology, 227550, Industrial, Manufacturing & Operational Systems, 173515, Engineering, 173507, Engineering & Transportation, 1000, Subjects, 283155, Books, 13769, Manufacturing, 227550, Industrial, Manufacturing & Operational Systems, 173515, Engineering, 173507, Engineering & Transportation, 1000, Subjects, 283155, Books, 13803, Reference, 392163011, American National Standards Institute (ANSI) Publications, 1061, Architecture, 7976021011, History, 13843, Measurements, 52156011, Patents & Inventions, 7921654011, Research, 173515, Engineering, 173507, Engineering & Transportation, 1000, Subjects, 283155, Books, 13809, Telecommunications & Sensors, 107172011, Antennas, 13816, Microwaves, 3747, Networks, 13801, Radar, 13818, Radio, 13684, Remote Sensing & GIS, 107177011, Satellite, 7921655011, Signal Processing, 13820, Telephone Systems, 13822, Television & Video, 173515, Engineering, 173507, Engineering & Transportation, 1000, Subjects, 283155, Books, 465600, New, Used & Rental Textbooks, 468220, Business & Finance, 468226, Communication & Journalism, 468204, Computer Science, 468224, Education, 468212, Engineering, 468206, Humanities, 468222, Law, 468228, Medicine & Health Sciences, 684283011, Reference, 468216, Science & Mathematics, 468214, Social Sciences, 684300011, Test Prep & Study Guides, 2349030011, Specialty Boutique, 283155, Books

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ISBN: 9781574446753

ID: 298801

INTRODUCTION TO SEMICONDUCTOR DEVICES; John R. Hauser Introduction Overview of MOS Device Characteristics MOSFET Device Scaling Manufacturing Issues and Challenges MOSFET Gate Stack Issues Advanced MOS Device Concepts Conclusions References OVERVIEW OF INTERCONNECT-COPPER AND LOW- INTEGRATION; Girish A. Dixit and Robert H. Havemann Introduction Dual Damascene Copper Integration Copper/Low Reliability Conclusion References SILICON MATERIALS; Wen Lin and Howard Huff Introduction Silicon Crystal Growth Processes Characteristics of Czochralski Silicon Growth Trends in Large Diameter Silicon Growth Wafer Preparation Epitaxial Growth Oxygen Behavior in Silicon Processing Other and New Applications of Silicon Materials Summary References SOI MATERIALS AND DEVICES; Sorin Cristoloveanu and G.K. Celler Introduction SOI Basics: A Tutorial SOI Wafer Fabrication Methods-Some Details Advanced Wafer Engineering Physical Characterization of SOI Wafers Electrical Characterization Partially Depleted SOI MOSFETs Fully Depleted SOI MOSFETs Scaling Trends Multiple-Gate SOI MOSFETs MEMS and Photonic Applications of SOI Conclusions Acknowledgements References SURFACE PREPARATION; Glenn W. Gale, Brian K. Kirkpatrick, and Frederick W. Kern Jr. RCA Clean Electrochemistry The Chemistry of Aqueous Solutions SC-1 Complexing Particle Removal Particle Adhesion Particle Removal-Chemical Undercutting Particle Removal-Electrophoretic Effects and DLVO Theory Particle Removal-Megasonics Wet Chemical Etching Oxide Etch Hydrofluoric Acid and Metallic Contamination Defects Related to Drying Polysilicon Etch Selective Nitride Etch Oxide/Nitride Etch Bulk Organic Removal/Photoresist Strip Photolithography Sulfuric/Oxidizer Chemistry Reaction Mechanism Sulfuric/Peroxide (PIRANHA) DI/OZONE Surface Preparation and Cleaning for Interconnect Subtractive Aluminum Interconnect Key Subtractive Aluminum Cleaning Challenges with Associated Defects Copper/Low- Dual Damascene Interconnect Key Cu/Low- Challenges with Associated Defects Typical Defects Control and Monitoring of Surface Treatment Processes References SUPERCRITICAL CARBON DIOXIDE IN SEMICONDUCTOR CLEANING; Mohammed J. Meziani, Pankaj Pathak, and Ya-Ping Sun Introduction Supercritical Fluids Supercritical CO2 Cleaning Processes Processing Equipment Conclusions and Perspectives References ION IMPLANTATION; Michael Ameen, Ivan Berry, Walter Class, Hans-Joachim Gossmann, and Leonard Rubin Introduction Ion Implant Physics and Materials Science Applications of Ion Implantation Commercial Ion Implantation Equipment Process Control in Ion Implantation References DOPANT DIFFUSION; Sanjay Banerjee Introduction Definition of Point Defects Thermodynamics of Defects Migration and Diffusion of Point Defects Fick's Laws of Diffusion Equilibrium Formulation for Dopant Diffusion Non-Equilibrium Formulation for Dopant Diffusion Diffusion in Strained Silicon Conclusions and Future Research Acknowledgments References OXIDATION AND GATE DIELECTRICS; Technology Technology eBook, CRC Press

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The second edition of this standard-setting handbook provides an up-to-date reference to the individual processes, equipment, and materials of semiconductor manufacturing technologies. Edited by renowned experts, this book provides graphs, tables, and formulas for easy access to information as well as extensive references for further study. This edition features new and updated chapters on silicon materials, SOI materials and devices, surface preparation, ion implantation, dopant diffusion, in-line metrology, yield modeling, photomask fabrication, failure analysis, damascene copper electroplating, rapid thermal processing, interlevel dielectrics, plasma etch, atomic layer deposition, and more. Handbook of Semiconductor Manufacturing Technology Buch (fremdspr.) Bücher>Fremdsprachige Bücher>Englische Bücher, CRC Press

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Handbook of Semiconductor Manufacturing Technology
Autor:

Doering, Robert / Nishi, Yoshio (eds.)

Titel:

Handbook of Semiconductor Manufacturing Technology

ISBN-Nummer:

1574446754

The second edition of this standard-setting handbook provides an up-to-date reference to the individual processes, equipment, and materials of semiconductor manufacturing technologies. Edited by renowned experts, this book provides graphs, tables, and formulas for easy access to information as well as extensive references for further study. This edition features new and updated chapters on silicon materials, SOI materials and devices, surface preparation, ion implantation, dopant diffusion, in-line metrology, yield modeling, photomask fabrication, failure analysis, damascene copper electroplating, rapid thermal processing, interlevel dielectrics, plasma etch, atomic layer deposition, and more.

Detailangaben zum Buch - Handbook of Semiconductor Manufacturing Technology


EAN (ISBN-13): 9781574446753
ISBN (ISBN-10): 1574446754
Gebundene Ausgabe
Erscheinungsjahr: 2007
Herausgeber: CRC PR INC
1720 Seiten
Gewicht: 2,744 kg
Sprache: eng/Englisch

Buch in der Datenbank seit 07.11.2007 22:19:09
Buch zuletzt gefunden am 12.12.2016 15:58:36
ISBN/EAN: 1574446754

ISBN - alternative Schreibweisen:
1-57444-675-4, 978-1-57444-675-3

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