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Sub-Half-Micron Lithography for ULSIs (Hardback)
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2000, ISBN: 0521570808

ID: 11203794798

[EAN: 9780521570800], Neubuch, [PU: CAMBRIDGE UNIVERSITY PRESS, United Kingdom], Technology|Electricity, Technology|Electronics|Circuits|General, Technology|Electronics|Circuits|Integrated, Technology|Electronics|Circuits|Printed, Technology|Engineering|Electrical, Technology|Industrial Technology, Language: English Brand New Book. In semiconductor-device fabrication processes, lithography technology is used to print circuit patterns on semiconductor wafers. The remarkable miniaturization of semiconductor devices has been made possible only because of the continuous progress in lithography technology. However, for the trend of ever-increasing miniaturization to continue a breakthrough in lithography technology is now needed. This book describes advanced techniques under development in Japan and elsewhere that represent the key to future semiconductor-device fabrication. The background to developments in lithography technology, trends in ULSI technology and future prospects are reviewed, and the requirements that future lithography technology must meet are described. Several important lithography methods, such as deep UV lithography, X-ray lithography, electron-beam lithography, and focused ion-beam lithography are described in detail by experts in each area. The principles underlying each of these methods are illustrated at the beginning of each chapter to help the reader understand the basis of the different approaches.

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Sub-Half-Micron Lithography for ULSIs - Katsumi Suzuki, Shinji Matsui, Yukinori Ochiai
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Sub-Half-Micron Lithography for ULSIs - gebunden oder broschiert

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[EAN: 9780521570800], Neubuch, [PU: Cambridge University Press], BRAND NEW, Sub-Half-Micron Lithography for ULSIs, Katsumi Suzuki, Shinji Matsui, Yukinori Ochiai, In semiconductor-device fabrication processes, lithography technology is used to print circuit patterns on semiconductor wafers. The remarkable miniaturization of semiconductor devices has been made possible only because of the continuous progress in lithography technology. However, for the trend of ever-increasing miniaturization to continue a breakthrough in lithography technology is now needed. This book describes advanced techniques under development in Japan and elsewhere that represent the key to future semiconductor-device fabrication. The background to developments in lithography technology, trends in ULSI technology and future prospects are reviewed, and the requirements that future lithography technology must meet are described. Several important lithography methods, such as deep UV lithography, X-ray lithography, electron-beam lithography, and focused ion-beam lithography are described in detail by experts in each area. The principles underlying each of these methods are illustrated at the beginning of each chapter to help the reader understand the basis of the different approaches.

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Sub-Half-Micron Lithography for ULSIs (Cambridge Studies in Semiconductor Physics  &  Microelectronic Engineering) - Katsumi Suzuki; Shinji Matsui; Yukinori Ochiai
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Katsumi Suzuki; Shinji Matsui; Yukinori Ochiai:
Sub-Half-Micron Lithography for ULSIs (Cambridge Studies in Semiconductor Physics & Microelectronic Engineering) - gebrauchtes Buch

ISBN: 0521570808

ID: 4809716

In semiconductor-device fabrication processes, lithography technology is used to print circuit patterns on semiconductor wafers. The remarkable miniaturization of semiconductor devices has been made possible only because of the continuous progress in lithography technology. However, for the trend of ever-increasing miniaturization to continue, a breakthrough in lithography technology is now needed. This book describes advanced techniques under development that represent the key to future semiconductor-device fabrication. To help the reader understand the background to developments in lithography technology, trends in ULSI technology and future prospects are reviewed, and the requirements that future lithography technology must meet are described. Several important lithography methods, such as deep UV lithography, x-ray lithography, electron-beam lithography, and focused ion-beam lithography are described in detail by experts in each area. Other relevant technologies, such as those that concern resist materials, metrology, and defect inspection and repair are also described. electrical and electronics,engineering Books, Cambridge University Press

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Sub-Half-Micron Lithography for ULSIs (Cambridge Studies in Semiconductor P hysics & Microelectronic Engineering) - Ochiai, Yukinori
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Ochiai, Yukinori:
Sub-Half-Micron Lithography for ULSIs (Cambridge Studies in Semiconductor P hysics & Microelectronic Engineering) - gebunden oder broschiert

2000, ISBN: 0521570808

ID: 716888191

[EAN: 9780521570800], [PU: Cambridge University Press], A crisp clean hardcover, no markings throughout: In semiconductor-device fabrication processes, lithography technology is used to print circuit patterns on semiconductor wafers. The remarkable miniaturization of semiconductor devices has been made possible only because of the continuous progress in lithography technology. However, for the trend of ever-increasing miniaturization to continue, a breakthrough in lithography technology is now needed. This book describes advanced techniques under development that represent the key to future semiconductor-device fabrication. To help the reader understand the background to developments in lithography technology, trends in ULSI technology and future prospects are reviewed, and the requirements that future lithography technology must meet are described. Several important lithography methods, such as deep UV lithography, x-ray lithography, electron-beam lithography, and focused ion- beam lithography are described in detail by experts in each area. Other relevant technologies, such as those that concern resist materials, metrology, and defect inspection and repair are also described.

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Sub-Half-Micron Lithography for ULSIs - Katsumi Suzuki
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Sub-Half-Micron Lithography for ULSIs - gebunden oder broschiert

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Hardback, [PU: CAMBRIDGE UNIVERSITY PRESS], Describes advanced techniques under development that represent the key to future semiconductor-device fabrication., Semi-conductors & Super-conductors

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Details zum Buch
Sub-Half-Micron Lithography for Ulsis
Autor:

Editor-Katsumi Suzuki; Editor-Shinji Matsui; Editor-Yukinori Ochiai

Titel:

Sub-Half-Micron Lithography for Ulsis

ISBN-Nummer:

0521570808

Detailangaben zum Buch - Sub-Half-Micron Lithography for Ulsis


EAN (ISBN-13): 9780521570800
ISBN (ISBN-10): 0521570808
Gebundene Ausgabe
Erscheinungsjahr: 2000
Herausgeber: CAMBRIDGE UNIV PR
342 Seiten
Sprache: eng/Englisch

Buch in der Datenbank seit 31.05.2007 00:44:41
Buch zuletzt gefunden am 22.06.2016 21:08:31
ISBN/EAN: 0521570808

ISBN - alternative Schreibweisen:
0-521-57080-8, 978-0-521-57080-0

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